Method and system for improving optical measurements on small targets
US9927370B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 5, 2016 |
| Grant date | Mar 27, 2018 |
| Priority date | — |
| Expiry date | Oct 5, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8848
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A control system and method are provided for use in managing optical measurements on target structures. The control system comprises: data input utility for receiving input data indicative of a size of a target structure to be measured and input data indicative of illumination and collection channels of an optical measurement system; data processing utility for analyzing the input data, and an interplay of Point Spread Functions (PSFs) of the illumination and collection channels, and determining data indicative of optional tailoring of apertures to be used in the optical measurement system for optimizing ensquared energy for measurements on the given target structure, the optimal tailoring composing at least one of the following: an optimal ratio between numerical apertures of the illumination and collection channels; and an optimal orientation offset of physical apertures in the illumination and collection channels.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.