Patent · US Active

Projection exposure apparatus with at least one manipulator

US9927714B2 · kind B2 · utility

1Cited by

1References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Boris Bittner · Roth, DE
Stefan Rist · Aalen, DE

Key dates

Filing date	Apr 11, 2017
Grant date	Mar 27, 2018
Priority date	—
Expiry date	Apr 11, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/705
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A microlithography projection exposure apparatus includes a projection lens at least one manipulator to change an optical effect of at least one optical element of the projection lens, and a travel establishing device for generating a travel command for the at least one manipulator.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.