Patent · US Active

Plasma induced flow electrode structure, plasma induced flow generation device, and method of manufacturing plasma induced flow electrode structure

US9934944B2 · kind B2 · utility

4Cited by
20References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 14, 2016
Grant dateApr 3, 2018
Priority date
Expiry dateSep 27, 2036

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02C20/30
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

In one embodiment, a plasma induced flow electrode structure has an electrode block, an insulating layer and an electrode layer. The electrode block has first and second surfaces and through holes penetrating between these first and second surfaces. The insulating layer is disposed on the first surface and inside the through holes. The electrode layer is disposed on the insulating layer of the first surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.