Plasma induced flow electrode structure, plasma induced flow generation device, and method of manufacturing plasma induced flow electrode structure
US9934944B2 · kind B2 · utility
4Cited by
20References
15Claims
0Family size
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Key dates
| Filing date | Jul 14, 2016 |
| Grant date | Apr 3, 2018 |
| Priority date | — |
| Expiry date | Sep 27, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/30
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In one embodiment, a plasma induced flow electrode structure has an electrode block, an insulating layer and an electrode layer. The electrode block has first and second surfaces and through holes penetrating between these first and second surfaces. The insulating layer is disposed on the first surface and inside the through holes. The electrode layer is disposed on the insulating layer of the first surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.