Lens heating aware source mask optimization for advanced lithography

US9940427B2 · kind B2 · utility

Assignee

• ASML NETHERLANDS B.V. · NL

Inventors

• Michael M. Crouse · Hopewell Junction, US
• Youri Johannes Laurentius Maria Van Dommelen · Ballston Lake, US
• Peng Liu · Beijing, CN
• Hua-Yu Liu · Palo Alto, US
• Aiqin JIANG · New York, US
• Wenjin Huang · Beijing, CN

Key dates

• Filing date: Jan 29, 2013
• Grant date: Apr 10, 2018
• Expiry date: Jun 17, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70891
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination source and the design layout, the computing of the multi-variable cost function accounting for lens heating effects; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.