Patent · US Active

Aligning and focusing an electron beam in an X-ray source

US9947502B2 · kind B2 · utility

1Cited by

6References

20Claims

0Family size

Assignee

Excillum AB · SE

Inventors

Oscar Hemberg · Village of La Jolla, US
Tomi Tuohimaa · Sollentuna, SE
Björn Sundman · Sollentuna, SE

Key dates

Filing date	May 5, 2016
Grant date	Apr 17, 2018
Priority date	—
Expiry date	Aug 11, 2036

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2235/082
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.