Patent · US Active

Particle beam apparatus and method for operating a particle beam apparatus

US9947504B2 · kind B2 · utility

0Cited by

6References

20Claims

0Family size

Assignee

Carl Zeiss Microscopy GmbH · DE

Inventors

Klaus Hegele · Aalen, DE
Edgar Fichter · Aalen, DE
Michel Aliman · Oberkochen, DE
Dirk Preikszas · Oberkochen, DE
Christian Hendrich · Aalen, DE
Momme Mommsen · Oberkochen, DE
Michael Schnell · Ingolstadt, DE
Kai Schubert · Oberkochen, DE

Key dates

Filing date	Jun 13, 2016
Grant date	Apr 17, 2018
Priority date	—
Expiry date	Jun 13, 2036

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/152
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.