Environmentally green process and composition for cobalt wet etch
US9947547B2 · kind B2 · utility
1Cited by
8References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 29, 2016 |
| Grant date | Apr 17, 2018 |
| Priority date | — |
| Expiry date | Jun 29, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76897
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An environmentally green wet etch process for selective removal of cobalt metal generally includes applying water that is free of added buffers, acids, and/or bases to a substrate including exposed cobalt metal. The process can be utilized to form recesses where desired such as may be implemented for metal contact fill, metal gate fill, interconnect fill, or the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.