Semiconductor device manufacturing apparatus having plurality of gas exhausting pipes and gas sensors
US9951422B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 5, 2016 |
| Grant date | Apr 24, 2018 |
| Priority date | — |
| Expiry date | Oct 5, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A semiconductor device manufacturing apparatus includes a shower head at a top of a chamber, a gas supplying part on the shower head, a susceptor in the chamber, and a gas exhausting part under the chamber. The chamber has first and second reaction spaces that are virtually separated from each other. A first gas supply pipe supplies a first gas into the first reaction space and a second gas supply pipe supplies a second gas into the second reaction space. A first gas exhausting pipe is adjacent the first reaction space and a second gas exhausting pipe is adjacent the second reaction space on opposite sides of the susceptor. A first gas sensor connected to the first gas exhausting pipe senses the second gas and a second gas sensor connected to the second gas exhausting pipe senses the first gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.