Sukjin Chung
7Patents
2h-index
20Co-inventors
43Inventor score
Filing activity: Feb 25, 2014 → Nov 18, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10822694B2 | Substrate processing apparatus and method of cleaning the same | Chemistry; Metallurgy | 3 | Active |
| US9082611B2 | Methods of forming a layer | Electricity | 3 | Active |
| US9951422B2 | Semiconductor device manufacturing apparatus having plurality of gas exhausting pipes and gas sensors | Electricity | 1 | Active |
| US10844491B2 | Gas supply unit and substrate processing system | Chemistry; Metallurgy | 0 | Active |
| US11854864B2 | Semiconductor device including trench isolation layer and method of forming the same | Electricity | 0 | Active |
| US10607832B2 | Method and apparatus for forming a thin layer | Electricity | 0 | Active |
| US11211284B2 | Semiconductor device including trench isolation layer and method of forming the same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.