Ebeam non-universal cutter
US9952511B2 · kind B2 · utility
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2References
23Claims
0Family size
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Key dates
| Filing date | Dec 19, 2014 |
| Grant date | Apr 24, 2018 |
| Priority date | — |
| Expiry date | Jan 8, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31796
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA is a non-universal cutter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.