High-voltage supply unit and circuit arrangement for generating a high voltage for a particle beam apparatus

US9953804B2 · kind B2 · utility

Assignee

• Carl Zeiss Microscopy GmbH · DE

Inventors

• Edgar Fichter · Aalen, DE
• Joerg Fober · Heubach, DE
• Dirk Preikszas · Oberkochen, DE
• Christian Hendrich · Aalen, DE
• Michael Schnell · Ingolstadt, DE
• Momme Mommsen · Oberkochen, DE

Key dates

• Filing date: Apr 22, 2016
• Grant date: Apr 24, 2018
• Expiry date: Apr 22, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/002
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.