Patent · US Active

Copolymer and associated layered article, and device-forming method

US9957339B2 · kind B2 · utility

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18References
8Claims
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Key dates

Filing dateAug 7, 2015
Grant dateMay 1, 2018
Priority date
Expiry dateAug 7, 2035

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2021/8592
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.