Copolymer and associated layered article, and device-forming method
US9957339B2 · kind B2 · utility
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18References
8Claims
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Key dates
| Filing date | Aug 7, 2015 |
| Grant date | May 1, 2018 |
| Priority date | — |
| Expiry date | Aug 7, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8592
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.