Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask
US9958775B2 · kind B2 · utility
3Cited by
0References
20Claims
0Family size
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Key dates
| Filing date | Dec 4, 2014 |
| Grant date | May 1, 2018 |
| Priority date | — |
| Expiry date | Dec 4, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2601/14
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y1 and Y2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A)
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.