Exposure management system
US9978163B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 9, 2015 |
| Grant date | May 22, 2018 |
| Priority date | — |
| Expiry date | Jan 18, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B15/02
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An exposure management system according to an embodiment includes a processing circuitry. The processing circuitry is configured to calculate a deviation index related to a difference between a target exposure index indicating an index of an exposure value that is set as a target of an X-ray image taking process and an image-taking-period exposure index indicating an index of an exposure value observed during the X-ray image taking process. The processing circuitry is configured to control so as to cause a display device to display history information from a predetermined time period indicating at least one selected from between image-taking-period exposure indices and deviation indices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.