Control of a sample mask from a fragment shader program
US9978171B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 27, 2015 |
| Grant date | May 22, 2018 |
| Priority date | — |
| Expiry date | Dec 29, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T15/005
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method, system, and computer program product for controlling a sample mask from a fragment shader are disclosed. The method includes the steps of generating a fragment for each pixel that is covered, at least in part, by a primitive and determining coverage information for each fragment corresponding to the primitive. Then, for each fragment, the method includes the steps of generating a sample mask by a fragment shader, replacing the coverage information for the fragment with the sample mask, and writing, based on the sample mask, a result generated by the fragment shader to a memory. The method may be implemented on a parallel processing unit configured to implement, at least in part, a graphics processing pipeline.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.