Apparatus for dressing urethane foam pad for use in polishing
US9981361B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 22, 2014 |
| Grant date | May 29, 2018 |
| Priority date | — |
| Expiry date | Feb 13, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02024
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A dressing apparatus for dressing a urethane foam pad, for use in polishing, by bringing diamond abrasive grains into sliding contact with the urethane foam pad, includes a support for holding the grains. The grains have multiple grit sizes, and include a high-grit diamond abrasive grain with a grit size of #170 or more and a low-grit diamond abrasive grain with a grit size of #140 or less. The grains are held by the support such that height positions of dressing surfaces of the grains are on the same plane. The dressing surfaces come into contact with the urethane foam pad. As a result, a dressing apparatus is capable of sufficiently roughening the surface of the urethane foam pad by one-time dressing without closing holes of the foaming part of the urethane foam pad, enabling short dressing time, long dressing interval, and inhibition of lowering of productivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.