Substrate holding device

US9988712B2 · kind B2 · utility

Assignee

• AIXTRON SE · DE

Inventors

• Eduardo Osman Piniero Sufan · Aachen, DE
• Daniel Claessens · Aachen, DE
• Adam Boyd · Kelmis, BE

Key dates

• Filing date: Nov 13, 2015
• Grant date: Jun 5, 2018
• Expiry date: Nov 13, 2035

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/6875
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A device for holding at least one substrate in a process chamber of a CVD or PVD reactor includes a flat upper side on which at least one bearing area for the at least one substrate is located. An outline contour line corresponding to the outline contour of the substrate is flanked by positioning edges for positioning a respective section of an edge of the substrate. The device further includes carrying protrusions projecting from a bearing area base surface of the bearing area that is surrounded by the outline contour line. The carrying protrusions have contact surfaces that are raised in relation to the bearing area base surface, on which contact surfaces the substrate can be placed. In order to improve the temperature homogeneity of the surface of the substrate, each of the carrying protrusions originate from a recess of the bearing area base surface.