Nanoshell, method of fabricating same and uses thereof
US9991458B2 · kind B2 · utility
16Cited by
1References
11Claims
0Family size
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Key dates
| Filing date | May 21, 2013 |
| Grant date | Jun 5, 2018 |
| Priority date | — |
| Expiry date | Dec 30, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/13
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of fabricating a nanoshell is disclosed. The method comprises coating a nanometric core made of a first material by a second material, to form a core-shell nanostructure and applying non-chemical treatment to the core-shell nanostructure so as to at least partially remove the nanometric core, thereby fabricating a nanoshell. The disclosed nanoshell can be used in the fabrication of transistors, optical devices (such as CCD and CMOS sensors), memory devices and energy storage devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.