Patent · US Active

Mirror module, in particular for a microlithographic projection exposure appararatus

US9996015B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Jens Prochnau · Oberkochen, DE
Dirk Schaffer · Jena, DE
Andreas Wurmbrand · Aalen, DE
Bernhard Gellrich · Aalen, DE
Markus Kern · Teltow, DE

Key dates

Filing date	Feb 14, 2017
Grant date	Jun 12, 2018
Priority date	—
Expiry date	Feb 14, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/709
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The disclosure relates to a mirror module, in particular for a microlithographic projection exposure apparatus, including a mirror, which has a mirror body and an optically effective surface. The mirror body has a first material, and a supporting structure for connecting the mirror body to an objective structure. The supporting structure has a second material. The first material and the second material differ in terms of their coefficients of thermal expansion by less than 0.5*10−6K−1 in a temperature range around an operating temperature which is reached by the mirror module during operation in the region of the connection of the mirror body to the supporting structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.