Patent · US Active

Self-decap cavity fabrication process and structure

US9999134B2 · kind B2 · utility

1Cited by
38References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 25, 2016
Grant dateJun 12, 2018
Priority date
Expiry dateMar 25, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2203/1383
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

A PCB having multiple stacked layers laminated together. The laminated stack includes regular flow prepreg and includes a recessed cavity, a bottom perimeter of which is formed by a photo definable, or photo imageable, polymer structure, such as a solder mask frame, and a protective film. The solder mask frame and protective film protect inner core circuitry at the bottom of the cavity during the fabrication process, as well as enable the use of regular flow prepreg in the laminated stack.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.