Patent · US Expired

Processing machine for electron beam lithography system

USD352910S · kind S · design

7Cited by
4References
1Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 8, 1993
Grant dateNov 29, 1994
Priority date
Expiry dateNov 29, 2008

Classification

  • Technology area (CPC —)General

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.