Discharge chamber for a plasma processing apparatus
USD907593S1 · kind S1 · design
9Cited by
21References
1Claims
0Family size
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Key dates
| Filing date | Jul 18, 2017 |
| Grant date | Jan 12, 2021 |
| Priority date | — |
| Expiry date | Jan 12, 2036 |
Classification
- Technology area (CPC —)General
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.