Device manufacture involving lithographic processing
USRE36964E · kind E · reissue
3Cited by
8References
65Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 29, 1994 |
| Grant date | Nov 21, 2000 |
| Priority date | — |
| Expiry date | Apr 29, 2014 |
Classification
- Technology area (CPC —)General
Abstract
Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on discrimination as between scattered and unscattered radiation by accelerated electrons.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.