Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers
USRE40920E1 · kind E1 · reissue
Assignee
Inventors
Key dates
| Filing date | May 1, 2007 |
| Grant date | Sep 22, 2009 |
| Priority date | — |
| Expiry date | May 1, 2027 |
Classification
- Technology area (CPC —)General
Abstract
New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.