Inventor · Chemnitz, DE

Axel Feicke

2Patents
1h-index
4Co-inventors
27Inventor score

Filing activity: Nov 17, 2006 → Oct 25, 2007

Most-cited inventions

PatentTitleAreaCited byStatus
US7820343B2 Method for producing a photomask, method for patterning a layer or layer stack and resist stack on a mask substrate Physics 1 Active
US7811727B2 Method for determining an exposure dose and exposure apparatus Emerging Cross-Sectional Technologies 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.