Method for determining an exposure dose and exposure apparatus

US7811727B2 · kind B2 · utility

Assignee

• ADVANCED MASK TECHNOLOGY CENTER GMBH & CO. KG · DE

Inventors

• Martin Sczyrba · Dresden, DE
• Markus Waiblinger · Dresden, DE
• Axel Feicke · Chemnitz, DE
• Karsten Bubke · Dresden, DE

Key dates

• Filing date: Nov 17, 2006
• Grant date: Oct 12, 2010
• Expiry date: Jul 21, 2029

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/143
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A method of determining an exposure dose for writing a pattern using an electron beam writer determines a target dose in the exposure region to obtain a predetermined energy deposition in a specific position of the exposure region, the predetermined energy deposition being larger than a reference energy deposition in the non-exposure region. The target dose is locally increased in a marginal region of the exposure region (the marginal region being adjacent the exposure boundary) to a value that obtains an energy deposition in the marginal region higher than the predetermined energy deposition. Optionally, the target dose can be locally decreased in an intermediate region of the exposure region (the intermediate region being adjacent the marginal region) to a value that obtains an energy deposition in the intermediate region smaller than the predetermined energy deposition. Also provided is an exposure device for carrying out the method.