Benjamin M. Rathsack
3Patents
1h-index
3Co-inventors
30Inventor score
Filing activity: Mar 31, 2010 → Mar 31, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8449293B2 | Substrate treatment to reduce pattern roughness | Physics | 2 | Active |
| US8338086B2 | Method of slimming radiation-sensitive material lines in lithographic applications | Electricity | 1 | Active |
| US8435728B2 | Method of slimming radiation-sensitive material lines in lithographic applications | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.