Boris Efraty
5Patents
2h-index
34Co-inventors
40Inventor score
Filing activity: Jan 10, 2014 → Jun 30, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10831108B2 | Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology | Electricity | 2 | Active |
| US10242290B2 | Method, system, and user interface for metrology target characterization | Electricity | 2 | Active |
| US9874527B2 | Removing process-variation-related inaccuracies from scatterometry measurements | Physics | 2 | Active |
| US10408602B2 | Quality estimation and improvement of imaging metrology targets | Physics | 0 | Active |
| US10366483B2 | Wafer notch detection | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.