Method, system, and user interface for metrology target characterization

US10242290B2 · kind B2 · utility

Assignee

• KLA-TENCOR CORPORATION · US

Inventors

• Inna Tarshish-Shapir · Haifa, IL
• Yoel Feler · Haifa, IL
• Anat Marchelli · Migdal HaEmek, IL
• Berta Dinu · Migdal HaEmek, IL
• Vladimir Levinski · Milpitas, US
• Boris Efraty · Carmiel, IL
• Nuriel Amir · Yoqneam Illit, IL
• Mark Ghinovker · Migdal HaEmek, IL
• Amnon Manassen · Haifa, IL
• Sigalit Robinzon · Timrat, IL

Key dates

• Filing date: Jan 10, 2014
• Grant date: Mar 26, 2019
• Expiry date: Aug 14, 2035

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L22/30
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Methods and systems are provided, which identify specified metrology target abnormalities using selected metrics and classify the identified target abnormalities geometrically to link them to corresponding sources of error. Identification may be carried out by deriving target signals such as kernels from specified regions of interest (ROIs) from corresponding targets on a wafer, calculating the metrics from the target signals using respective functions and analyzing the metrics to characterize the targets.