Carsten Fülber
2Patents
2h-index
5Co-inventors
27Inventor score
Filing activity: Dec 4, 2000 → Sep 28, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6686098B2 | Lithography method and lithography mask | Physics | 9 | Expired |
| US6620559B2 | Photomask, method of lithographically structuring a photoresist layer with the photomask, and method of producing magnetic memory elements | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.