Chieh-Ming Wang
2Patents
2h-index
2Co-inventors
24Inventor score
Filing activity: Sep 21, 2000 → Oct 14, 2000
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6492097B1 | Process for increasing a line width window in a semiconductor process | Physics | 7 | Expired |
| US6444410B1 | Method of improving photoresist profile | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.