Christopher Wade
7Patents
4h-index
16Co-inventors
50Inventor score
Filing activity: Aug 3, 2000 → Oct 26, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6440495B1 | Chemical vapor deposition of ruthenium films for metal electrode applications | Chemistry; Metallurgy | 61 | Expired |
| US6479100B2 | CVD ruthenium seed for CVD ruthenium deposition | Chemistry; Metallurgy | 34 | Expired |
| US7569424B2 | Method of forming a wall structure in a microelectronic assembly | Electricity | 25 | Active |
| US7479685B2 | Electronic device on substrate with cavity and mitigated parasitic leakage path | Electricity | 7 | Expired |
| US8299626B2 | Microelectronic package | Electricity | 4 | Active |
| US8080854B2 | Electronic device on substrate with cavity and mitigated parasitic leakage path | Electricity | 2 | Active |
| US9349672B2 | Microelectronic package | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.