Congjun Wu
3Patents
0h-index
9Co-inventors
24Inventor score
Filing activity: Mar 22, 2019 → Jan 24, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11892778B2 | Device for adjusting wafer, reaction chamber, and method for adjusting wafer | Electricity | 0 | Active |
| US11410849B2 | Device and method for measuring film longitudinal temperature field during nitride epitaxial growth | Electricity | 0 | Active |
| US11340440B2 | Real-time monitoring microscopic imaging system for nitride MOCVD epitaxial growth mode | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.