Da Yang
3Patents
3h-index
7Co-inventors
36Inventor score
Filing activity: May 22, 2009 → Sep 7, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8114306B2 | Method of forming sub-lithographic features using directed self-assembly of polymers | Emerging Cross-Sectional Technologies | 69 | Active |
| US8336003B2 | Method for designing optical lithography masks for directed self-assembly | Physics | 29 | Active |
| US8856693B2 | Method for designing optical lithography masks for directed self-assembly | Physics | 10 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.