Daehee Weon
4Patents
2h-index
12Co-inventors
41Inventor score
Filing activity: Nov 30, 2008 → Sep 19, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8133817B2 | Shallow trench isolation etch process | Electricity | 6 | Active |
| US8529776B2 | High lateral to vertical ratio etch process for device manufacturing | Electricity | 4 | Active |
| US10460921B2 | High lateral to vertical ratio etch process for device manufacturing | Electricity | 1 | Active |
| US11031233B2 | High lateral to vertical ratio etch process for device manufacturing | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.