Daisuke Shiraishi
62Patents
6h-index
44Co-inventors
72Inventor score
Filing activity: Sep 6, 2001 → Nov 1, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6616759B2 | Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor | Emerging Cross-Sectional Technologies | 33 | Expired |
| US9110461B2 | Semiconductor manufacturing equipment | Emerging Cross-Sectional Technologies | 10 | Active |
| US8098325B2 | Digital camera | Physics | 9 | Active |
| US7166480B2 | Particle control device and particle control method for vacuum processing apparatus | Electricity | 8 | Expired |
| US6706543B2 | Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a therefor | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6828165B2 | Semiconductor plasma processing apparatus with first and second processing state monitoring units | Emerging Cross-Sectional Technologies | 6 | Expired |
| US7330346B2 | Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus | Electricity | 6 | Active |
| US8486290B2 | Etching apparatus, analysis apparatus, etching treatment method, and etching treatment program | Electricity | 5 | Active |
| US9324588B2 | Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus | Electricity | 5 | Active |
| US8992721B2 | Plasma processing apparatus | Physics | 5 | Active |
| US7058470B2 | Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor | Emerging Cross-Sectional Technologies | 5 | Expired |
| US6908529B2 | Plasma processing apparatus and method | Electricity | 4 | Expired |
| US7962678B2 | Bus arbitration apparatus and method | Physics | 4 | Active |
| US8341453B2 | Transmission apparatus that transmits data according to a protocol, and method for measuring time in the transmission apparatus | Electricity | 3 | Active |
| US9091595B2 | Analysis method, analysis device, and etching processing system | Electricity | 3 | Active |
| US7343217B2 | System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation | Emerging Cross-Sectional Technologies | 3 | Expired |
| US8924001B2 | Etching apparatus, control simulator, and semiconductor device manufacturing method | Electricity | 3 | Active |
| US8828184B2 | Plasma processing apparatus and plasma processing method | Electricity | 3 | Active |
| US7515360B2 | Lens barrel and lens barrel system | Physics | 2 | Active |
| US10510519B2 | Plasma processing apparatus and data analysis apparatus | Electricity | 2 | Active |
| US8282849B2 | Etching process state judgment method and system therefor | Electricity | 2 | Active |
| US7839583B2 | Cam follower for lens barrel and lens barrel | Physics | 2 | Active |
| US8140727B2 | Bus arbitration apparatus and method | Physics | 2 | Active |
| US9443704B2 | Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus | Electricity | 2 | Active |
| US9464936B2 | Plasma processing apparatus and analyzing apparatus | Electricity | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.