Daniel E. Engelhard
3Patents
2h-index
3Co-inventors
37Inventor score
Filing activity: Feb 4, 2003 → Jan 3, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6791679B2 | Adaptive correlation of pattern resist structures using optical metrology | Emerging Cross-Sectional Technologies | 21 | Expired |
| US7440881B2 | Adaptive correlation of pattern resist structures using optical metrology | Emerging Cross-Sectional Technologies | 4 | Active |
| US9146193B2 | Scatterometry metrology methods and methods of modeling formation of a vertical region of a multilayer semiconductor substrate to comprise a scatterometry target | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.