Patent · US Active

Gradient block copolymers for directed self-assembly

US10961383B2 · kind B2 · utility

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3References
21Claims
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Key dates

Filing dateSep 17, 2018
Grant dateMar 30, 2021
Priority date
Expiry dateDec 30, 2038

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08L2203/20
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Novel block copolymers (“BCPs”) having non-random distributions of comonomers within at least one of the blocks and methods of using those BCPs in directed self-assembly (“DSA”) processes are provided. The non-random (e.g., gradient-creating) distributions can be customized in order to concentrate the desired comonomer properties in predetermined areas of the BCP. These BCPs can achieve perpendicular orientation with simple annealing and offer superior long-range ordering and lower defectivity when compared to prior art BCPs. These BCPs can be incorporated into compositions that simultaneously offer the benefits of high-χ and rapid thermal-annealing kinetics while maintaining similar or improved guide process windows when compared to prior art BCPs.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.