Dave Trussell
6Patents
6h-index
14Co-inventors
52Inventor score
Filing activity: Feb 14, 2002 → Jan 29, 2010
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6744212B2 | Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power density conditions | Electricity | 63 | Expired |
| US7683289B2 | Apparatus and method for controlling plasma density profile | Electricity | 27 | Active |
| US7405521B2 | Multiple frequency plasma processor method and apparatus | Electricity | 24 | Expired |
| US8674255B1 | Apparatus and method for controlling etch uniformity | Performing Operations; Transporting | 13 | Active |
| US8299390B2 | Apparatus and method for controlling plasma density profile | Electricity | 12 | Active |
| US7276135B2 | Vacuum plasma processor including control in response to DC bias voltage | Electricity | 11 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.