David K. Lam
34Patents
10h-index
31Co-inventors
75Inventor score
Filing activity: Nov 3, 2000 → Jun 6, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9478395B1 | Alignment and registration targets for multiple-column charged particle beam lithography and inspection | Electricity | 18 | Active |
| US9595419B1 | Alignment and registration targets for multiple-column charged particle beam lithography and inspection | Electricity | 15 | Active |
| US9466463B1 | Charged particle beam substrate inspection using both vector and raster scanning | Electricity | 15 | Active |
| US9556521B1 | Precision deposition using miniature-column charged particle beam arrays | Electricity | 13 | Active |
| US9620332B1 | Charged particle beam substrate inspection using both vector and raster scanning | Electricity | 12 | Active |
| US9207539B1 | Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems | Electricity | 12 | Active |
| US8999627B1 | Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp | Electricity | 11 | Active |
| US10026589B1 | Alignment and registration targets for charged particle beam substrate patterning and inspection | Electricity | 11 | Active |
| US9466464B1 | Precision substrate material removal using miniature-column charged particle beam arrays | Electricity | 11 | Active |
| US9673114B1 | Precision substrate material removal using miniature-column charged particle beam arrays | Electricity | 10 | Active |
| US9184027B1 | Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp | Electricity | 10 | Active |
| US8999628B1 | Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems | Electricity | 10 | Active |
| US9453281B1 | Precision deposition using miniature-column charged particle beam arrays | Electricity | 10 | Active |
| US10020200B1 | Patterned atomic layer etching and deposition using miniature-column charged particle beam arrays | Electricity | 9 | Active |
| US9824859B1 | Precision material modification using miniature-column charged particle beam arrays | Electricity | 8 | Active |
| US9210053B2 | System and method for management of network monitoring information | Electricity | 7 | Active |
| US9881817B1 | Precision substrate material multi-processing using miniature-column charged particle beam arrays | Electricity | 7 | Active |
| US10523433B1 | Secure intra-chip hardware micro-segmentation using charged particle beam processing | Electricity | 6 | Active |
| US10312091B1 | Secure permanent integrated circuit personalization | Electricity | 6 | Active |
| US10341108B1 | Secure permanent integrated circuit personalization | Electricity | 5 | Active |
| US10020166B1 | Alignment and registration targets for charged particle beam substrate patterning and inspection | Electricity | 4 | Active |
| US9822443B1 | Precision material modification using miniature-column charged particle beam arrays | Electricity | 4 | Active |
| US6804310B1 | Decision feedback loop apparatus and method for channel estimation and de-rotation using burst pilot bits | Electricity | 2 | Expired |
| US11550459B2 | User interfaces for maps and navigation | Physics | 1 | Active |
| US10978303B1 | Secure permanent integrated circuit personalization | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.