David (Tawei) Lin
4Patents
0h-index
4Co-inventors
24Inventor score
Filing activity: Mar 11, 2019 → Feb 11, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11279850B2 | Bulk ruthenium chemical mechanical polishing composition | Electricity | 0 | Active |
| US11034859B2 | Barrier ruthenium chemical mechanical polishing slurry | Electricity | 0 | Active |
| US11999876B2 | Bulk ruthenium chemical mechanical polishing composition | Electricity | 0 | Active |
| US11505718B2 | Barrier ruthenium chemical mechanical polishing slurry | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.