David Walker
7Patents
5h-index
7Co-inventors
48Inventor score
Filing activity: Aug 31, 1998 → Dec 4, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6179693A | In-situ/self-propelled polishing pad conditioner and cleaner | Performing Operations; Transporting | 23 | Expired |
| US6135865A | CMP apparatus with built-in slurry distribution and removal | Performing Operations; Transporting | 14 | Expired |
| US6269510A | Post CMP clean brush with torque monitor | Emerging Cross-Sectional Technologies | 13 | Expired |
| US6352596B2 | Post CMP cleaning method using a brush cleaner with torque monitor | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6468135B1 | Method and apparatus for multiphase chemical mechanical polishing | Performing Operations; Transporting | 8 | Expired |
| US6299515A | CMP apparatus with built-in slurry distribution and removal | Performing Operations; Transporting | 2 | Expired |
| US7067220B2 | Pattern compensation techniques for charged particle lithographic masks | Emerging Cross-Sectional Technologies | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.