Doni Parnell
4Patents
1h-index
8Co-inventors
30Inventor score
Filing activity: Jan 12, 2015 → Dec 15, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9391141B2 | Method for producing fin structures of a semiconductor device in a substrate | Electricity | 11 | Active |
| US11087973B2 | Method of selective deposition for BEOL dielectric etch | Electricity | 0 | Active |
| US10192956B2 | Method for producing fin structures of a semiconductor device in a substrate | Electricity | 0 | Active |
| US10319905B2 | Method and system for performing post-etch annealing of a workpiece | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.