Ed C. Lee
15Patents
8h-index
19Co-inventors
69Inventor score
Filing activity: Apr 25, 1984 → Nov 8, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6905547B1 | Method and apparatus for flexible atomic layer deposition | Chemistry; Metallurgy | 46 | Expired |
| US4566026A | Integrated circuit bimetal layer | Electricity | 27 | Expired |
| US6254936A | Environment exchange control for material on a wafer surface | Physics | 22 | Expired |
| US6977098B2 | Method of uniformly coating a substrate | Performing Operations; Transporting | 15 | Expired |
| US6468586B1 | Environment exchange control for material on a wafer surface | Physics | 14 | Expired |
| US6780461B2 | Environment exchange control for material on a wafer surface | Physics | 13 | Expired |
| US6248171A | Yield and line width performance for liquid polymers and other materials | Performing Operations; Transporting | 12 | Expired |
| US6669779B2 | Yield and line width performance for liquid polymers and other materials | Performing Operations; Transporting | 8 | Expired |
| US6242364A | Plasma deposition of spin chucks to reduce contamination of silicon wafers | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6844027B1 | Environment exchange control for material on a wafer surface | Physics | 7 | Expired |
| US7208262B2 | Yield and line width performance for liquid polymers and other materials | Performing Operations; Transporting | 3 | Expired |
| US7255975B2 | Yield and line width performance for liquid polymers and other materials | Performing Operations; Transporting | 1 | Expired |
| US6911091B2 | Environment exchange control for material on a wafer surface | Physics | 1 | Expired |
| US6955720B2 | Plasma deposition of spin chucks to reduce contamination of Silicon wafers | Emerging Cross-Sectional Technologies | 1 | Expired |
| US7625692B2 | Yield and line width performance for liquid polymers and other materials | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.