Erik Puttlitz
3Patents
2h-index
13Co-inventors
37Inventor score
Filing activity: Jun 5, 1995 → Mar 13, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6207333A | Mask with attenuating phase-shift and opaque regions | Physics | 21 | Expired |
| US5547812A | Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer | Emerging Cross-Sectional Technologies | 16 | Expired |
| US6664023B2 | Controlled aging of photoresists for faster photospeed | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.