Inventor · Heidenheim, DE

Erwin Gaber

5Patents
2h-index
20Co-inventors
51Inventor score

Filing activity: Jul 22, 2000 → May 19, 2020

Most-cited inventions

PatentTitleAreaCited byStatus
US6388823B1 Optical system, especially a projection light facility for microlithography Physics 63 Expired
US6593998B2 Projection exposure system Physics 2 Expired
US7079331B2 Device for holding a beam splitter element Physics 2 Expired
US11474281B2 Optical element and method of making an optical element Electricity 0 Active
US10698135B2 Optical element and method of making an optical element Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.