Optical system, especially a projection light facility for microlithography

US6388823B1 · kind B1 · utility

Assignee

• Carl-Zeiss-Stiftung trading as Carl Zeiss · DE

Inventors

• Erwin Gaber · Heidenheim, DE
• Christian Wagner · Rosenheim, DE
• Hubert Holderer · Oberkochen, DE
• Michael Gerhard · Aalen, DE
• Erich Merz · Oberkochen, DE
• Jochen Becker · Oberkochen, DE
• Arie Cornelis Scheiberlich · Veldhoven, NL

Key dates

• Filing date: Jul 22, 2000
• Grant date: May 14, 2002
• Expiry date: Jul 22, 2020

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70358
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An optical system, in particular a projection exposure device for microlithography, with a slit-shaped image field or illumination which is not rotationally symmetrical, has an optical element, in particular, a lens or a mirror which is arranged in a mount (2), and actuators (3) which engage on the optical element (1) at least approximately perpendicularly to the optical axis. The actuators (3) bring about forces and or moments, which are not rotationally symmetrical and which deviate from the radial, on the optical element (1), for the production of bendings which take place substantially without thickness changes.