Francois Weisbuch
4Patents
1h-index
2Co-inventors
30Inventor score
Filing activity: Dec 10, 2010 → Mar 30, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9646220B2 | Methods and media for averaging contours of wafer feature edges | Physics | 3 | Active |
| US9690187B2 | Sampling for OPC model building | Physics | 0 | Active |
| US8332783B2 | Control of critical dimensions in optical imaging processes for semiconductor production by extracting imaging imperfections on the basis of imaging tool specific intensity measurements and simulations | Physics | 0 | Active |
| US10114282B2 | Sampling for OPC building | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.