Gary N. Cai
3Patents
1h-index
14Co-inventors
41Inventor score
Filing activity: Nov 14, 2005 → Jun 26, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7511287B2 | Systems and methods that mitigate contamination and modify surface characteristics during ion implantation processes through the introduction of gases | Electricity | 4 | Active |
| US9431247B2 | Method for ion implantation | Electricity | 1 | Active |
| US9748072B2 | Lower dose rate ion implantation using a wider ion beam | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.