German E. Rylov
9Patents
6h-index
34Co-inventors
59Inventor score
Filing activity: Jan 23, 2002 → Apr 14, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7088758B2 | Relax gas discharge laser lithography light source | Electricity | 27 | Expired |
| US7366219B2 | Line narrowing module | Electricity | 16 | Expired |
| US6798812B2 | Two chamber F2 laser system with F2 pressure based line selection | Electricity | 14 | Expired |
| US6801560B2 | Line selected F2 two chamber laser system | Electricity | 12 | Expired |
| US8126027B2 | Line narrowing module | Electricity | 10 | Active |
| US7653095B2 | Active bandwidth control for a laser | Electricity | 9 | Active |
| US7058107B2 | Line selected F2 two chamber laser system | Electricity | 4 | Expired |
| US7218661B2 | Line selected F2 two chamber laser system | Electricity | 4 | Expired |
| US7643528B2 | Immersion lithography laser light source with pulse stretcher | Physics | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.